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Structural and Optical Properties of In2S3 Thin Films Prepared by Flash Evaporation
In2S3 Thin Films Flash Evaporation
2010/12/7
In2S3thin films were deposited by flash evaporation of In2S3 powder. The effect of annealing in vacuum and under sulphur atmosphere on the structural and optical properties of these films was investig...
Structural, Optical and Electrochromic Properties of Nanocrystalline TiO2 thin Films Prepared by Spin Coating
Electrochromic Properties Nanocrystalline TiO2 thin Films Spin Coating
2010/12/7
Nanocrystalline TiO2 thin filmswere prepared by spin coating on covered glass substrates with an indium tin oxide (ITO) layer. The structural, electrochromic and optical properties of the films were i...
X-Ray Reflectivity Study of Reactive DC Sputter Deposited Al2O3 Thin Films
X-Ray Reflectivity Reactive DC Sputter Al2O3 Thin Films
2010/12/15
X-ray reflection was performed on Al2O3 thin films obtained by dc magnetron sputtering of aluminium in an argon/oxygen atmosphere. Two kind of films (amorphous and γ-Al2O3) were deposited on polished ...
Optical and Electrical Properties of SnO2:F Thin Films Obtained by R.F. Sputtering With Various Targets
SnO2 F Thin Films R.F Various Targets
2010/12/16
Tin oxide films were deposited on glass substrates by reactive and non reactive r.f. sputtering using different types of targets corresponding to various Sn/F atomic ratio: hot pressed Sn–SnF2 or SnO2...
Reproducibility of Properties of SnOx Thin Films Prepared by Reactive Sputtering
SnOx Thin Films Reactive Sputtering substrate temperature
2010/12/23
The preparation of tin dioxide films by low energy reactive sputtering of tin and tin-antimony (1-10% wt. Sb) in an oxygen – argon atmosphere is described. The dependences of oxygen content in the ran...
The adhesion of evaporated or sputtered thin films to substrates is one of the most important characterising parameters in their fabrication. It is a conventional method to scratch the films using a s...
Experimental and Theoretical Characterization of Thick and Thin Films for Microwave Uses on 99.6% Alumina Substrates
Thick and Thin Films Microwave Uses 99.6% Alumina Substrates
2010/12/27
In a previous paper, we showed, with a microwave quality factor (Q) measurement, that in the X band and with alumina substrates, thick film losses are not worse than thin film losses when the inks are...
The Effect of Sequential Heat Treatment on Resistance and Temperature Coefficient of Resistance (TCR) of NiCr Thin Films
Sequential Heat Treatment TCR NiCr Thin Films
2010/12/28
Measurements have been made of resistivity as a function of temperature in the range 290 to 600°K for vacuum deposited NiCr thin films subjected to different heat treatments in air.
While the films p...